| ▲ | LargoLasskhyfv 3 days ago | ||||||||||||||||||||||||||||||||||||||||
They could employ something similar to https://minimalfab.eu https://minimalfab.com https://www.yokogawa.com/industries/semiconductor/minimal-fa... These are available since about a decade, and would enable such short turnaround times for single chips. | |||||||||||||||||||||||||||||||||||||||||
| ▲ | adrian_b 3 days ago | parent [-] | ||||||||||||||||||||||||||||||||||||||||
Short turnaround times does not mean a single day. Even an ancient 1 micron CMOS process requires something like one hundred process steps, many of which may need up to a few hours in an oven. If completely automatized, it could be done in a week for small batches, but not in a day. One day could be achieved only for semi-custom integrated circuits, where the customer only specifies the interconnection of the components existing on the pre-processed chip. Decades ago, when unlike today, there were a very great number of integrated circuit producers, there were many who offered a set of IC dies from which to choose one, where each variant could have different sizes, while including various mixtures of digital gates and analog components like amplifiers, comparators, voltage references etc., and after choosing one of the available base dies the customer would specify only how to interconnect the components and how to bond the die to the package pads. With such semi-custom integrated circuits, it would be possible to complete their fabrication process in a day, by using direct exposure, instead of masks, for the final metal layers. At the 1 micron level, the photoresist can be patterned directly with a laser projector. There is no need for an electron-beam machine, like for nanometer-resolution lithography. | |||||||||||||||||||||||||||||||||||||||||
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