| ▲ | Someone 2 hours ago | |
High-NA EUV, apparently. https://www.reuters.com/business/asml-says-next-gen-euv-tool...: - ASML's High-NA EUV machines ready for high-volume production - Machines have processed 500,000 wafers, showing technical readiness - Full integration into manufacturing expected in 2-3 years, ASML's CTO says After that, it may be X-rays. A disruptive step would be to move to 3D printing, but that (among other issues) is too slow at the moment. Maybe, ideas from nano robotics (https://en.wikipedia.org/wiki/Nanorobotics) can help there. | ||
| ▲ | q3k 2 hours ago | parent [-] | |
> A disruptive step would be to move to 3D printing The lithography equivalents of that are laser direct write lithography and e-beam lithography. They've been used for decades in research labs, but they're impossibly slow for any mass production. Atomic Semi are trying to make some derivative of these processes happen at a commercial scale. | ||