That is a very high quality video.

One thing I am curious about - how many generations of process shrink is one of these machines good for? They talk about regular EUV and then High-NA EUV for finer processes, but presumably each machine works for multiple generations of process shrink? If so, what needs to be adjusted to move to a finer generation of lithography and how is it done? Does ASML come in and upgrade the machine for the next process generation, or does it come out of the box already able to deliver to a resolution a few steps beyond the current state of the art?

If you’re interested in this stuff Asianometry has lots of great videos. They’re not all on semiconductors, but he’s done a lot on this history, developments, and what’s going on in that world.

https://www.youtube.com/c/Asianometry/videos